SAFIER



Trademark Coverage

No Class Specified

industrial chemicals used for shrinking photoresist patterns in the lithography process

Timeline
  • Jan 03
    2014
    International Registration Renewed
  • Jul 22
    2012
    Notification Processed By IB
  • Nov 12
    2011
    Death Of International Registration
  • Jul 27
    2006
    Final Decision Transaction Processed By IB
  • Jul 10
    2006
    Final Disposition Notice Sent To IB
  • Jul 07
    2006
    Final Disposition Processed
  • Jun 09
    2006
    Final Disposition Notice Created, To Be Sent To IB
  • Oct 04
    2005
    Registered Principal Register
  • Jul 12
    2005
    Published For Opposition
  • Jun 22
    2005
    Notice Of Publication
  • Mar 31
    2005
    Law Office Publication Review Completed
  • Mar 30
    2005
    Assigned To LIE
  • Mar 21
    2005
    Approved For PUB Principal Register
  • Mar 01
    2005
    Amendment From Applicant Entered
  • Dec 27
    2004
    Correspondence Received In Law Office
  • Dec 27
    2004
    Paper Received
  • Sep 02
    2004
    Refusal Processed By IB
  • Jul 06
    2004
    Non Final Action Mailed
  • Jul 01
    2004
    Assigned To Examiner
  • Feb 17
    2004
    New Application Entered In TRAM
  • Feb 12
    2004
    SN Assigned For SECT 66 A APPL From IB